九游会J9·(china)官方网站-真人游戏第一品牌

The main use of Trichlorosilane is to manufacture polysilicon and silane coupling agent. As the upstream of the polysilicon industry, with the improvement of the capacity utilization rate of the polysilicon industry and the gradual release of new capacity, the supply and demand environment of Trichlorosilane products has been greatly improved, and the industry prosperity has increased.

Potassium hydroxide is an important chemical product, which is widely used in chemical industry, dyes, light industrial food, medicine, agriculture and other industries. In recent years, with the adjustment of the industrial structure of China's potassium hydroxide industry, the scale and technical advantages of large enterprises have emerged, and the market share has gradually increased. At present, there are about 10 domestic potassium hydroxide production enterprises. In recent years, the

Potassium sulfate is widely used in agriculture and industry. Potassium sulfate is a commonly used potash fertilizer, and is also the main raw material of sulfur based ammonia phosphorus potassium compound fertilizer. In industry, Potassium sulfate is mainly used in glass, dyes, spices, medicine and other industries.

High purity SiCI4 is the main raw material for producing quartz communication optical fibers. At present, high-purity SiCI4 is mainly used in China to prepare optical fiber preforms (referred to as optical rods), which are important basic materials for the production of optical fibers and cables. For the fiber optic cable industry, the technical level of fiber optic preforms plays a decisive role. Its quality directly affects the quality of fiber optic products.

As one of the indispensable basic and supporting materials in the production of electronic industry, such as Very Large Scale Integration, flat panel display devices, compound semiconductor devices, solar cells, optical fibers, etc., electronic specialty gas is an important auxiliary material in the semiconductor industry. Our electronic grade silicon dichloride and Trichlorosilane are mainly used for advanced wafer processing, memory chip manufacturing, and silicon epitaxial chip manufacturing.

Application: Vapor phase silicon dioxide is an extremely important high-tech ultra-fine inorganic new material. Due to its small particle size, it has a large specific surface area, strong surface adsorption, large surface energy, high chemical purity, good dispersion performance, thermal resistance, resistance and other special properties. With its superior stability, reinforcement, thickening and Thixotropy, it is widely used in various industries as an additive, catalyst carrier, petrochemica